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authorSylwester Nawrocki <s.nawrocki@samsung.com>2013-03-14 06:01:24 -0400
committerMauro Carvalho Chehab <mchehab@redhat.com>2013-03-31 09:55:19 -0400
commitfc39f46b54b600f053bf9bab757023344e97925e (patch)
tree43c702bd3b9f5d6765a0f67c5f03ec3ae2d57a41 /include
parent4163851f7b997e24602cad8e0eae96d31a252548 (diff)
[media] V4L: Add MATRIX option to V4L2_CID_EXPOSURE_METERING control
This patch adds a menu option to the V4L2_CID_EXPOSURE_METERING control for multi-zone metering. Signed-off-by: Sylwester Nawrocki <s.nawrocki@samsung.com> Signed-off-by: Kyungmin Park <kyungmin.park@samsung.com> Signed-off-by: Mauro Carvalho Chehab <mchehab@redhat.com>
Diffstat (limited to 'include')
-rw-r--r--include/uapi/linux/v4l2-controls.h1
1 files changed, 1 insertions, 0 deletions
diff --git a/include/uapi/linux/v4l2-controls.h b/include/uapi/linux/v4l2-controls.h
index 7da22cec30cd..69bd5bb0d5af 100644
--- a/include/uapi/linux/v4l2-controls.h
+++ b/include/uapi/linux/v4l2-controls.h
@@ -658,6 +658,7 @@ enum v4l2_exposure_metering {
658 V4L2_EXPOSURE_METERING_AVERAGE = 0, 658 V4L2_EXPOSURE_METERING_AVERAGE = 0,
659 V4L2_EXPOSURE_METERING_CENTER_WEIGHTED = 1, 659 V4L2_EXPOSURE_METERING_CENTER_WEIGHTED = 1,
660 V4L2_EXPOSURE_METERING_SPOT = 2, 660 V4L2_EXPOSURE_METERING_SPOT = 2,
661 V4L2_EXPOSURE_METERING_MATRIX = 3,
661}; 662};
662 663
663#define V4L2_CID_SCENE_MODE (V4L2_CID_CAMERA_CLASS_BASE+26) 664#define V4L2_CID_SCENE_MODE (V4L2_CID_CAMERA_CLASS_BASE+26)