diff options
author | Sylwester Nawrocki <s.nawrocki@samsung.com> | 2013-03-14 06:01:24 -0400 |
---|---|---|
committer | Mauro Carvalho Chehab <mchehab@redhat.com> | 2013-03-31 09:55:19 -0400 |
commit | fc39f46b54b600f053bf9bab757023344e97925e (patch) | |
tree | 43c702bd3b9f5d6765a0f67c5f03ec3ae2d57a41 /include | |
parent | 4163851f7b997e24602cad8e0eae96d31a252548 (diff) |
[media] V4L: Add MATRIX option to V4L2_CID_EXPOSURE_METERING control
This patch adds a menu option to the V4L2_CID_EXPOSURE_METERING
control for multi-zone metering.
Signed-off-by: Sylwester Nawrocki <s.nawrocki@samsung.com>
Signed-off-by: Kyungmin Park <kyungmin.park@samsung.com>
Signed-off-by: Mauro Carvalho Chehab <mchehab@redhat.com>
Diffstat (limited to 'include')
-rw-r--r-- | include/uapi/linux/v4l2-controls.h | 1 |
1 files changed, 1 insertions, 0 deletions
diff --git a/include/uapi/linux/v4l2-controls.h b/include/uapi/linux/v4l2-controls.h index 7da22cec30cd..69bd5bb0d5af 100644 --- a/include/uapi/linux/v4l2-controls.h +++ b/include/uapi/linux/v4l2-controls.h | |||
@@ -658,6 +658,7 @@ enum v4l2_exposure_metering { | |||
658 | V4L2_EXPOSURE_METERING_AVERAGE = 0, | 658 | V4L2_EXPOSURE_METERING_AVERAGE = 0, |
659 | V4L2_EXPOSURE_METERING_CENTER_WEIGHTED = 1, | 659 | V4L2_EXPOSURE_METERING_CENTER_WEIGHTED = 1, |
660 | V4L2_EXPOSURE_METERING_SPOT = 2, | 660 | V4L2_EXPOSURE_METERING_SPOT = 2, |
661 | V4L2_EXPOSURE_METERING_MATRIX = 3, | ||
661 | }; | 662 | }; |
662 | 663 | ||
663 | #define V4L2_CID_SCENE_MODE (V4L2_CID_CAMERA_CLASS_BASE+26) | 664 | #define V4L2_CID_SCENE_MODE (V4L2_CID_CAMERA_CLASS_BASE+26) |